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Plasma-enhanced chemical vapor deposition
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Characteristics of a plasma sputter-type negative ion source with a Zirconium target
.
by
Mendenilla, Alexander G.
; 2000.
Subject:
Plasma-enhanced chemical vapor deposition
;
Plasma devices
.
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Relevance: 42.04%
Growth of amorphous carbon, diamond-like-carbon and diamond films via plasma-enhanced and hot-filament chemical vapor deposition
.
by
Lubguban, Jorge A.
; 1996.
Subject:
Plasma-enhanced chemical vapor deposition
;
Carbon -- Experiments
.
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Relevance: 40.95%
Formation of SiH on silicon (100) using low energy negative hydrogen ions from a magnetized sheet plasma source
.
by
Fernandez, Marcedon S.
; 2004.
Subject:
Amorphous semiconductors
;
Silane compounds
;
Hydrogen ions
;
Plasma-enhanced chemical vapor deposition
.
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Relevance: 39.28%
Plasma deposition of amorphous silicon-based materials
.
by
Bruno, Giovanni
; Boston: Academic Press, 1995.
Subject:
Amorphous semiconductors -- Design and construction
;
Plasma-enhanced chemical vapor deposition
;
Silicon alloys
.
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Relevance: 38.88%
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