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Your search for [subject]Chemical vapor deposition returned 12 records. |
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Low pressure chemical vapor deposition of Sio2 on porous vycor tubes for gas separation.
by Ramos, Emmanuel S.; Diliman, Quezon City: University the Philippines, 1996.
Subject: Chemistry; Silicon dioxide (SiO2) films -- Chemical vapor deposition; Gas separation -- Silicon dioxide on porous vycor tubes; Chemical vapor deposition -- Silicon dioxide.
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Growth of amorphous carbon, diamod-like-carbon and diamond films via plasma-enhanced and hot-filament chemical vapor deposition.
by Lubguban, Jorge A.;
Subject: Chemical vapor deposition; Carbon; Plasma-enhanced chemical deposition; Semiconductor films.
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Low pressure chemical vapor deposition of SiO2 on porous vycor tubes for gas separation.
by Ramos, Emmanuel S., 1970-;
Subject: Chemical vapor deposition; Gases -- Separation; Silica; Vapor-plating.
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Parametric and kinetic study of silicon nitride film deposition on silicon wafer by low pressure chemical vapor deposition (LPCVD) method.
by Velasco, Angelito A.; 2002.
Subject: Silicon nitride; Chemical vapor deposition; Arrhenius equation.
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Growth of amorphous carbon, diamond-like-carbon and diamond films via plasma-enhanced and hot-filament chemical vapor deposition.
by Lubguban, Jorge A.; 1996.
Subject: Plasma-enhanced chemical vapor deposition; Carbon -- Experiments.
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The Chemistry of metal CVD.
by Hampden-Smith, Mark J.; New York: VCH Publishing, 1994.
Subject: Chemical vapor deposition; Electronic circuit design; Metallic films.
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Low temperature PECVD diamond and DLC thin films.
by Malapit, Giovanni M.; 2001.
Subject: Diamonds, Artificial; Diamond thin films; Chemical vapor deposition; Raman spectroscopy.
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Formation of SiH on silicon (100) using low energy negative hydrogen ions from a magnetized sheet plasma source.
by Fernandez, Marcedon S.; 2004.
Subject: Amorphous semiconductors; Silane compounds; Hydrogen ions; Plasma-enhanced chemical vapor deposition.
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Plasma deposition of amorphous silicon-based materials.
by Bruno, Giovanni; Boston: Academic Press, 1995.
Subject: Amorphous semiconductors -- Design and construction; Plasma-enhanced chemical vapor deposition; Silicon alloys.
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Characteristics of a plasma sputter-type negative ion source with a Zirconium target.
by Mendenilla, Alexander G.; 2000.
Subject: Plasma-enhanced chemical vapor deposition; Plasma devices.
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